Startup debuts ‘nanoimprint’ litho tool for 20-nm designs

December 4, 2002 | Source: Semiconductor Business News

Molecular Imprints Inc. plans to unveil next week “the world’s first step and flash imprint lithography” tool for use in processing a range of emerging devices at the 100-nm (0.10-micron) node, down to a few nanometers and at about one-tenth the cost of traditional projection systems.

The tool is geared for the emerging nanotechnology field.